JPH0346544B2 - - Google Patents

Info

Publication number
JPH0346544B2
JPH0346544B2 JP58174772A JP17477283A JPH0346544B2 JP H0346544 B2 JPH0346544 B2 JP H0346544B2 JP 58174772 A JP58174772 A JP 58174772A JP 17477283 A JP17477283 A JP 17477283A JP H0346544 B2 JPH0346544 B2 JP H0346544B2
Authority
JP
Japan
Prior art keywords
thin film
particles
substrate
particle flow
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58174772A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6067661A (ja
Inventor
Yasuo Morohoshi
Akira Nishiwaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP17477283A priority Critical patent/JPS6067661A/ja
Priority to US06/649,858 priority patent/US4601922A/en
Priority to DE19843434433 priority patent/DE3434433A1/de
Publication of JPS6067661A publication Critical patent/JPS6067661A/ja
Publication of JPH0346544B2 publication Critical patent/JPH0346544B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
JP17477283A 1983-09-21 1983-09-21 薄膜形成装置 Granted JPS6067661A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP17477283A JPS6067661A (ja) 1983-09-21 1983-09-21 薄膜形成装置
US06/649,858 US4601922A (en) 1983-09-21 1984-09-12 Method of forming a layer of thin film on a substrate having a multiplicity of mesh-like holes
DE19843434433 DE3434433A1 (de) 1983-09-21 1984-09-19 Verfahren und vorrichtung zum erzeugen einer duennen schicht auf einem substrat

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17477283A JPS6067661A (ja) 1983-09-21 1983-09-21 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS6067661A JPS6067661A (ja) 1985-04-18
JPH0346544B2 true JPH0346544B2 (en]) 1991-07-16

Family

ID=15984396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17477283A Granted JPS6067661A (ja) 1983-09-21 1983-09-21 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS6067661A (en])

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW495812B (en) * 2000-03-06 2002-07-21 Semiconductor Energy Lab Thin film forming device, method of forming a thin film, and self-light-emitting device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333640A (en) * 1976-09-10 1978-03-29 Hitachi Ltd Formation of orientation control film for liquid crystal display element
JPS53117559U (en]) * 1977-02-24 1978-09-19

Also Published As

Publication number Publication date
JPS6067661A (ja) 1985-04-18

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